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    National Tsing Hua University Institutional Repository > 原子科學院  > 工程與系統科學系 > 會議論文  >  Characteristics of a Novel ICP Source with a Deformable Bifilar Coil


    Please use this identifier to cite or link to this item: http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/47102


    Title: Characteristics of a Novel ICP Source with a Deformable Bifilar Coil
    Authors: K.C. Leou;J. H. Cheng;T.S. Chen;C.R. Hsu;W.C. Wu;W.Y. Chiang;T.L. Lin;C.H. Tsai
    教師: 柳克強
    Date: 1998
    Publisher: American Physical Society
    Relation: American Physical Society, 51st Annual Gaseous Electronics Conference & 4th International Conference on Reactive Plasmas October 19-22, 1998 Maui, Hawaii
    Keywords: characteristics
    ICP
    coil deformable
    Abstract: The characteristics of a low pressure inductively-coupled plasma (ICP) source which employs a novel coil design to maximize the source's operation window will be described. A uniform plasma density over an area larger than the wafer size is one of the most important requirements for the plasma sources used in ULSI processing tools. By making the coil deformable, the plasma density uniformity can be maintained over a wider operation window as system's parameters, such as gas chemistry, gas pressure, and chuck RF bias power, are varied to meet different process requirements, as compared to the ICP sources based on conventional fixed coil design. The other feature of the new coil design is that it has two sets of winding connected in parallel but 180 degrees opposite azymuthally. This arrangement in principle provides a better azymuthal symmetry than the conventional single winding planar coil. The system was characterized with several plasma diagnostic tools: a 2D RF-compensated Langmuir probe, a B-Dot probe, a heterodyne interferometer and spectroscopy/imaging of plasma-induced emissions. A wafer-type grided ion energy analyzer has also been developed to measure ion energy distribuition at different locations on the wafer. Experimental results show that the radial profile of plasma density changes as the coil is deformed. The effect is more pronounced at higher gas pressures where electron's mean free path becomes shorter and the plasma density profile is basically determined by the distribution of RF power deposition. The detailed experimental results will be presented.
    URI: http://adsabs.harvard.edu/abs/1998APS..GECEMP612L
    http://www.aps.org/
    http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/47102
    Appears in Collections:[工程與系統科學系] 會議論文

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