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    National Tsing Hua University Institutional Repository > 理學院 > 化學系 > 專利  >  Organometallic ruthenium and osmium source reagents for chemical vapor deposition

    Please use this identifier to cite or link to this item: http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/58159

    Title: Organometallic ruthenium and osmium source reagents for chemical vapor deposition
    Authors: Chi, Yun;Lee, Feng Jen;Liu, Chao-Shiuan
    教師: 季昀
    Date: 2001/10/16
    Relation: 專利權人:Chi, Yun
    Keywords: organometallic complexes
    CVD applications
    Sr.sub.2 RuO.sub.4
    bimetallic alloys
    Abstract: A series of organometallic complexes of the general formula [M(CO).sub.2 L.sub.2 ] was provided, wherein M is ruthenium or osmium metal, and L is a .beta.-diketonate ligand RC(O)CHC(O)R.sup.1 where each of R and R.sup.1 is independently selected from the group consisting of atoms of the element, C, H, O and F. These ruthenium and osmium complexes possess enhanced volatility and thermal stability characteristics, and are very suitable for CVD applications. Also disclosed are CVD methods by using these ruthenium or osmium complexes as source reagents for deposition of Ru, Os, RuO.sub.2, OsO.sub.2, and other Ru- or Os-containing films such as mixed metal oxide materials BaRuO.sub.3, SrRuO.sub.3, Sr.sub.2 RuO.sub.4 and Bi.sub.2 Ru.sub.2 O.sub.7 or bimetallic alloys Pt/Ru and Pd/Ru.
    URI: http://patft1.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-adv.htm&r=12&f=G&l=50&d=PTXT&S1=6303809&OS=6303809&RS=6303809
    Appears in Collections:[化學系] 專利

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