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    National Tsing Hua University Institutional Repository > 理學院 > 化學系 > 專利  >  Self-reducible copper(II) source reagents for chemical vapor deposition of copper metal


    Please use this identifier to cite or link to this item: http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/58161


    Title: Self-reducible copper(II) source reagents for chemical vapor deposition of copper metal
    Authors: Chi, Yun;Hsu, Peng-Fu;Lin, Tsung-Wu;Liu, Chao-Shiuan;Carty, Arthur J.
    教師: 季昀
    Date: 2002/4/9
    Relation: 專利權人:National Research Council of Canada;National Tsing-Hua University
    Keywords: CVD conditions
    lower-alkyl
    perfluorinated
    fluorine atoms
    Abstract: Volatile low melting solid Cu(II) metal complexes are provided which are capable of depositing a copper film on various substrates under CVD conditions in the absence of reducing carrier gas H.sub.2. These CU(II) metal complexes are represented by the structure formula: wherein R.sup.1 is selected from hydrogen, C1-C4 lower-alkyl or perfluorinated C1-C4 lower-alkyl groups, e.g., CH.sub.3, and CF.sub.3, etc., and wherein R.sup.2 is C1-C6 lower-alkyl or C1-C6 lower-alkene, which may be substituted by one or more fluorine atoms, by a C1-C6 lower-alkoxy group or by a C1-C6 di-lower-alkyl amino group, provided that when R.sup.1 is CF.sub.3, R.sup.2 is other than hydrogen or methyl. A process for depositing copper film using these Cu(II) metal complexes is also provided.
    URI: http://patft1.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=3&f=G&l=50&co1=AND&d=PTXT&s1=6369256&OS=6369256&RS=6369256
    http://v3.espacenet.com/textdoc?DB=EPODOC&IDX=US6369256&F=0
    http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/58161
    Appears in Collections:[化學系] 專利

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