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    National Tsing Hua University Institutional Repository > 研究中心 > 奈微與材料科技中心 > 期刊論文 >  Effect of titanium metal in the prenucleation of ultrananocrystalline diamond film growth at low substrate temperature

    Please use this identifier to cite or link to this item: http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/61646

    Title: Effect of titanium metal in the prenucleation of ultrananocrystalline diamond film growth at low substrate temperature
    Authors: Pradhan, Debabrata;Chen, Li-Ju;Lee, Yen-Chih;Lee, Chi-Young;Tai, Nyan-Hwa;Lin, I-Nan
    教師: 李紫原
    Date: 2006
    Publisher: Elsevier
    Relation: DIAMOND AND RELATED MATERIALS,Volume: 15,Issue: 11-12,Special Issue: Sp. Iss. SI,Pages: 1779-1783 Published: NOV-DEC 2006
    Keywords: CARBON FILMS
    Abstract: Ultrananocrystalline diamond (UNCD) film is usually grown in methane-argon plasma unlike methane-hydrogen plasma conventionally used to deposit microcrystalline diamond film. The prenucleation and growth mechanism of these two types of diamond films are different as well. The present study introduces titanium metal powder during ultrasonication of silicon substrate to enhance the nucleation density of UNCD. A titanium thin film was also used at the interface to find the effect of metal on the growth of diamond film. The nucleation density of as-grown film was estimated from the FE-SEM images. After 20 min of growth, nucleation density reaches to 10(11)/cm(2) on a surface pretreated by titanium mixed nanodiamond powder. Raman study was carried out for qualitative analysis of different carbon phase present in the UNCD films. X-ray photoelectron spectroscopy (XPS) was used to understand the growth mechanism by detecting the formation of carbon phase and metal carbide formation at the surface after stopping the growth at different time intervals. (c) 2006 Published by Elsevier B.V.
    URI: http://www.elsevier.com/wps/find/homepage.cws_home
    Appears in Collections:[奈微與材料科技中心] 期刊論文

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