National Tsing Hua University Institutional Repository:Chemical Purification of Silicon, Part III – Hydrogen Reduction of Trichlorosilane
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    National Tsing Hua University Institutional Repository > 歷任校長 > 劉兆玄 (1987-1993) > 期刊論文 >  Chemical Purification of Silicon, Part III – Hydrogen Reduction of Trichlorosilane


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    题名: Chemical Purification of Silicon, Part III – Hydrogen Reduction of Trichlorosilane
    作者: Chen, C.C.;Chang, M.M.;Shu, F. R.;Liu, C. S.
    教師: 劉兆玄
    日期: 1974
    出版者: Elsevier
    關聯: Journal of the Chinese Institute of Chemical Engineers, Elsevier, Volume 5, 1974, Pages 107-109
    关键词: Trichlorosilane
    Silicon
    摘要: An analytical procedure for the determination of metal and non-metal impurities at ppm level in crude silicon and purified trichlorosilane has been developed. The analyses of most metal impurities are carried out with direct atomic absorption spectrophotometric techniques. A fluoremetric method is developed ofr the assay of aluminum. Boron and phosphorus are determined via the methylene blue method and the molybdophosphoric acid method, respectively. Our analytical data clearly indicates that the chlorination process of our design is highly effective in removing impurities in the course of chemical purification of silicon.
    A brief review on various analytical methods currently available for the analysis of Al, B and P are also included in the present report.
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    URI: http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/81061
    显示于类别:[劉兆玄 (1987-1993)] 期刊論文
    [化學系] 期刊論文

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