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    National Tsing Hua University Institutional Repository > 原子科學院  > 工程與系統科學系 > 會議論文  >  Investigation of molecular rearrangement by AFM analysis of SAMs annealing process


    Please use this identifier to cite or link to this item: http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/47203


    Title: Investigation of molecular rearrangement by AFM analysis of SAMs annealing process
    Authors: Chun-Lung Wu;Hsin-Yi Hsieh;Fan-Gang Tseng;Ching-Chang Chieng
    教師: 錢景常
    Date: 2005
    Publisher: Nano Science and Technology Institute
    Relation: 2005 NSTI Nanotechnology Conference and Trade Show. NSTI Nanotech 2005, 2005, p 804-7
    Keywords: annealing
    atomic force microscopy
    molecular biophysics
    monolayers
    nanostructured materials
    self-assembly
    surface topography
    Abstract: Self assembly monolayers (SAMs) are easily prepared nano-film, and have been widely applied to improve device surface properties and biomaterial conjugation on substrates. Among various steps, annealing is one of the general processes for the improvement of SAMs formation quality. However, there have been not many methods developed to investigate the effects of this parameter quantitatively. This paper proposes to quantitatively investigate the effects of annealing on SAMs by both contact angle and interaction force measurement by AFM. Results demonstrate the quality of nano-film would been greatly improved by annealing process, and the film properties are also functions of temperature. The results demonstrated molecular rearrangement under thermal factor
    URI: http://www.nsti.org/procs/Nanotech2005v1/12/W910.06
    http://www.nsti.org/
    http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/47203
    Appears in Collections:[工程與系統科學系] 會議論文

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