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    National Tsing Hua University Institutional Repository > 原子科學院  > 工程與系統科學系 > 期刊論文 >  Heteroepitaxial diamond nucleation and growth on silicon by microwave plasma-enhanced chemical vapor deposition synthesis


    Please use this identifier to cite or link to this item: http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/47726


    Title: Heteroepitaxial diamond nucleation and growth on silicon by microwave plasma-enhanced chemical vapor deposition synthesis
    Authors: Guo,X. J.;Sung,S. L.;Lin,J. C.;Chen,F. R.;Shih,H. C.
    教師: 陳福榮
    Date: 2000
    Publisher: Elsevier
    Relation: Diamond and Related Materials, Elsevier, Volume 9, Issue 11, November 2000, Pages 1840-1849
    Keywords: Epitaxial growth
    High resolution electron microscopy
    Transmission electron microscopy
    Interfaces (materials)
    Morphology
    Scanning electron microscopy
    Hydrogen
    Methane
    Nucleation
    Synthesis (chemical)
    Diamond films
    Semiconducting silicon
    Plasma enhanced chemical vapor deposition
    Abstract: Heteroepitaxial diamond films were successfully nucleated and deposited on 1-inch diameter Si(001) substrates by microwave plasma-enhanced chemical vapor deposition (MPECVD). The precursor gases for the synthesis were methane and hydrogen. Before the application of a negative d.c. bias to the substrate, an in-situ carburization pre-treatment on the silicon was found to be an indispensable step towards the heteroepitaxial diamond on the silicon. Morphologies of the films were characterized by scanning electron microscopy (SEM). Interface observations based on the cross-sectional HRTEM directly reveal the heteroepitaxial diamond nucleation phenomena in detail. No interlayers of silicon carbide and/or amorphous carbon phases were observed. Tilt and azimuthal misorientation angles between the heteroepitaxial diamond crystals and the substrate were determined by combining the Ewald sphere construction in the reciprocal lattice space and the selected area diffraction (SAD) patterns taken across the interface.
    URI: http://www.elsevier.com/
    http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/47726
    Appears in Collections:[工程與系統科學系] 期刊論文

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