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    National Tsing Hua University Institutional Repository > 工學院  > 材料科學工程學系 > 會議論文  >  Optical and thermal properties of SiNX for MO disks


    Please use this identifier to cite or link to this item: http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/52855


    Title: Optical and thermal properties of SiNX for MO disks
    Authors: Chih-Huang Lai;Cheng-Lin Huang;Chun-Yu Hsu;I-Nan Lin;Jwo-Huei Jou
    教師: 周卓輝
    Date: 2000
    Publisher: International Society for Optical Engineering
    Relation: Optical storage and optical information processing. Conference, Taipei , TAIWAN, PROVINCE DE CHINE (26/07/2000)
    2000 , vol. 4081, pp. 28-35
    Keywords: SiN
    films
    TbFeCo films
    refractive index
    magnetic properties
    residual stress
    roughness
    MO
    Abstract: SiN, films were prepared by rf reactively sputtering. The refractive index of SiN, films was affected by total pressure and
    sputtering power. When the total pressure increased, the refractive index decreased. The reduction of sputtering power
    showed similar effect to raise the total gas pressure. The residual stress and roughness of SiN, films depended on the total
    pressure, sputtering power, and the thickness. The thermal cycles may result in irreversible change of residual stress of SiNx
    film. The magnetic properties of TbFeCo depended on the residual stress and roughness of SiNX in the trilayer
    SiN,/TbFeCo/SiN, samples. The coercivity of TbFeCo was enhanced in the samples with SiN, films having low stress and
    large rouglmess.
    URI: http://cat.inist.fr/?aModele=afficheN&cpsidt=782203
    http://spie.org/
    http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/52855
    Appears in Collections:[材料科學工程學系] 會議論文

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