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    National Tsing Hua University Institutional Repository > 理學院 > 物理系 > 期刊論文 >  Grain boundary scattering in the normal state resistivity of superconducting NbN thin films


    Please use this identifier to cite or link to this item: http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/54666


    Title: Grain boundary scattering in the normal state resistivity of superconducting NbN thin films
    Authors: Jyh-Haur Tyan;Juh Tzeng Lue
    教師: 呂助增
    Date: 1994
    Publisher: American Institute of Physics
    Relation: JOURNAL OF APPLIED PHYSICS, American Institute of Physics, Volume 75, Issue 1, JAN 1 1994, Pages 325-331
    Keywords: grain boundaries
    niobium compounds
    sputtered coatings
    superconducting thin films
    Abstract: NbN films prepared by reactive dc sputtering at high ambient pressure exhibit anomalous normal-state resistivity, as pervasively reported in literature. Most of the prepared films exhibit negative temperature coefficient of resistivity (TCR), while a few films are metallic (TCR>0) near room temperature and are nonmetallic (TCR<0) at temperatures between 200 and 300 K. Theoretical fittings by the model of grain-boundary scattering yield a better congruence with the experimental data, than those by exploiting the model of electron localization. This suggests that the transport mechanism of sputtered film prevails manipulated by grain boundary scattering rather than by defect scattering or by impurity scattering
    URI: http://www.aip.org/
    http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/54666
    Appears in Collections:[物理系] 期刊論文

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