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    National Tsing Hua University Institutional Repository > 電機資訊學院 > 電機工程學系 > 會議論文  >  The crystalline characterization of GaN epitaxial layer quality by the novel design of reactor chamber


    Please use this identifier to cite or link to this item: http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/68130


    Title: The crystalline characterization of GaN epitaxial layer quality by the novel design of reactor chamber
    Authors: C. C. Yang;M. C. Wu;C. H. Lee;G. C. Chi
    教師: 吳孟奇
    Date: 1999
    Publisher: The International on Optical Science, Engineering, and Instrumentation
    Relation: The International on Optical Science, Engineering, and Instrumentation, 1999
    Keywords: crystalline
    chamber
    URI: http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/68130
    Appears in Collections:[電機工程學系] 會議論文

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