English  |  正體中文  |  简体中文  |  Items with full text/Total items : 54367/62174 (87%)
Visitors : 14639688      Online Users : 56
RC Version 6.0 © Powered By DSPACE, MIT. Enhanced by NTHU Library IR team.
Scope Tips:
  • please add "double quotation mark" for query phrases to get precise results
  • please goto advance search for comprehansive author search
  • Adv. Search
    HomeLoginUploadHelpAboutAdminister Goto mobile version
    National Tsing Hua University Institutional Repository > 電機資訊學院 > 電機工程學系 > 會議論文  >  Enhancement of the Formation of TiSi2C54 Phase on Co-Sputtering Deposited Ti-Ta-Si film

    Please use this identifier to cite or link to this item: http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/70131

    Title: Enhancement of the Formation of TiSi2C54 Phase on Co-Sputtering Deposited Ti-Ta-Si film
    Authors: Wei-Chang Wang;Fon-Shan Huang
    教師: 葉鳳生
    Date: 1999
    Publisher: Materials Research Society
    Relation: Mat Res. Soc. Sym. Spring meeting, San Francisco, Ca., U. S. A., April 5-8, 1999
    Keywords: TiSi2C54
    Relation Link: http://www.mrs.org/home/
    URI: http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/70131
    Appears in Collections:[電機工程學系] 會議論文

    Files in This Item:

    There are no files associated with this item.


    SFX Query


    DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - Feedback