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    National Tsing Hua University Institutional Repository > 電機資訊學院 > 電機工程學系 > 期刊論文 >  Evolution of Microstructures in Hydrogenated Silicon Films Prepared by Diluted-hydrogen and Hydrogen-atom-treatment


    Please use this identifier to cite or link to this item: http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/72586


    Title: Evolution of Microstructures in Hydrogenated Silicon Films Prepared by Diluted-hydrogen and Hydrogen-atom-treatment
    Authors: K.C. Hsu;H. Chang;H.L. Hwang
    教師: 黃惠良
    Date: 1993
    Publisher: American Institute of Physics
    Relation: Journal of Applied Physics, American Institute of Physics, Volume 73, Issue 10, 1993, Pages 4841
    Keywords: Microstructures
    Hydrogenated
    Silicon
    Diluted-hydrogen
    Hydrogen-atom-treatment
    Abstract: Nuclear magnetic resonance (NMR), Fourier transform infrared spectroscopy, and Raman studies on microstructures of hydrogenated silicon films that were fabricated by diluted‐hydrogen and hydrogen‐atom‐treatment methods are presented. The diluted‐hydrogen samples tend to show a very sharp line shape in the NMR spectra at substrate temperatures higher than 300 °C, and the addition of atomic hydrogen treatment can produce the same NMR spectra at a lower temperature of about 250 °C. The Raman scattering spectra show that the atomic hydrogen treatment creates the microcrystalline phase while the diluted‐hydrogen method produces amorphous phase plus a small quantity of microcrystalline phase. The infrared‐absorption spectra also indicate an increase of SiH2 bonding configuration and a hydrogen content reduction when atomic hydrogen treatment is employed. The relation between the origin of the sharp line shape in the NMR spectra and the formation of the microcrystalline phase is also discussed. Together with increase of dark conductivity and reduction of the photo‐to‐dark conductivity ratio, these samples indicate that with appropriate hydrogen incorporation during deposition, and with plasma hydrogen treatment, these films should possess a much more compact structure. These results suggest that the degree of crystallinity of hydrogenated silicon films can be systematically adjusted. A qualitative model based on our experimental data is presented to illustrate the formation procedures of microcrystalline‐phase hydrogenated silicon under the influence of plasma hydrogen and hydrogen dilution.
    Relation Link: http://www.aip.org/
    URI: http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/72586
    Appears in Collections:[電機工程學系] 期刊論文

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