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    National Tsing Hua University Institutional Repository > 歷任校長 > 劉兆玄 (1987-1993) > 期刊論文 >  Chemical Purification of Silicon, Part I – Chlorination of Low Purity Silicon


    Please use this identifier to cite or link to this item: http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/81059


    Title: Chemical Purification of Silicon, Part I – Chlorination of Low Purity Silicon
    Authors: Chen, C.C.;Chang, M.M.;Shu, F. R.;Liu, C. S.
    教師: 劉兆玄
    Date: 1974
    Publisher: Elsevier
    Relation: Journal of the Chinese Institute of Chemical Engineers, Elsevier, Volume 5, 1974, Pages 93-98
    Keywords: Chlorination'Silicon
    Abstract: The chlorination of crude silicon (~98% purity) by anhydrous hydrogen chloride gas is studied in terms of the effects of temperature, HCl flow rate, silicon particle size and silicon packing height. A fairly wide range of working condition is found which will give the best yield of the desired product trichlorosilane SiHCl3. The results are discussed and compared with some existing data from the works of T.H. Loh [1] and G. Pauls [2, 3, 4]. An attempt using Cu powder as catalyst is tried but no catalytic effect is observed.
    Relation Link: http://203.145.193.110/NSC_INDEX/KSP/journalView/volumnView.jsp?journalId=J000004&volumnId=V000394&journalSetId=
    http://www.elsevier.com/wps/find/homepage.cws_home
    URI: http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/81059
    Appears in Collections:[劉兆玄 (1987-1993)] 期刊論文
    [化學系] 期刊論文

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