National Tsing Hua University Institutional Repository:Chemical Purification of Silicon, Part I – Chlorination of Low Purity Silicon
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    NTHUR > Presidents > Liu, Chao-Shiuan (1987-1993) > LCS Journal / Magazine Articles >  Chemical Purification of Silicon, Part I – Chlorination of Low Purity Silicon

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    Title: Chemical Purification of Silicon, Part I – Chlorination of Low Purity Silicon
    Authors: Chen, C.C.;Chang, M.M.;Shu, F. R.;Liu, C. S.
    Teacher: 劉兆玄
    Date: 1974
    Publisher: Elsevier
    Relation: Journal of the Chinese Institute of Chemical Engineers, Elsevier, Volume 5, 1974, Pages 93-98
    Keywords: Chlorination'Silicon
    Abstract: The chlorination of crude silicon (~98% purity) by anhydrous hydrogen chloride gas is studied in terms of the effects of temperature, HCl flow rate, silicon particle size and silicon packing height. A fairly wide range of working condition is found which will give the best yield of the desired product trichlorosilane SiHCl3. The results are discussed and compared with some existing data from the works of T.H. Loh [1] and G. Pauls [2, 3, 4]. An attempt using Cu powder as catalyst is tried but no catalytic effect is observed.
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    Appears in Collections:[Liu, Chao-Shiuan (1987-1993)] LCS Journal / Magazine Articles
    [Department of Chemistry] CHEM Journal / Magazine Articles

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