National Tsing Hua University Institutional Repository:Chemical Purification of Silicon, Part I – Chlorination of Low Purity Silicon
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    National Tsing Hua University Institutional Repository > 歷任校長 > 劉兆玄 (1987-1993) > 期刊論文 >  Chemical Purification of Silicon, Part I – Chlorination of Low Purity Silicon


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    题名: Chemical Purification of Silicon, Part I – Chlorination of Low Purity Silicon
    作者: Chen, C.C.;Chang, M.M.;Shu, F. R.;Liu, C. S.
    教師: 劉兆玄
    日期: 1974
    出版者: Elsevier
    關聯: Journal of the Chinese Institute of Chemical Engineers, Elsevier, Volume 5, 1974, Pages 93-98
    关键词: Chlorination'Silicon
    摘要: The chlorination of crude silicon (~98% purity) by anhydrous hydrogen chloride gas is studied in terms of the effects of temperature, HCl flow rate, silicon particle size and silicon packing height. A fairly wide range of working condition is found which will give the best yield of the desired product trichlorosilane SiHCl3. The results are discussed and compared with some existing data from the works of T.H. Loh [1] and G. Pauls [2, 3, 4]. An attempt using Cu powder as catalyst is tried but no catalytic effect is observed.
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    URI: http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/81059
    显示于类别:[劉兆玄 (1987-1993)] 期刊論文
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