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    National Tsing Hua University Institutional Repository > 歷任校長 > 劉兆玄 (1987-1993) > 期刊論文 >  Self-Reducible Cu(II) Source Reagents for the CVD of Copper


    Please use this identifier to cite or link to this item: http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/81111


    Title: Self-Reducible Cu(II) Source Reagents for the CVD of Copper
    Authors: Hsu, P. F.;Chi, Y.;Lin, T. W.;Liu, C. S.;Carty, A. J.;Peng, S. M.
    教師: 劉兆玄
    Date: 2001
    Publisher: Wiley-VCH Verlag Berlin
    Relation: CHEMICAL VAPOR DEPOSITION, Wiley-VCH Verlag Berlin, Volume 7, Issue 1, JAN 2001, Pages 28-31
    Keywords: CHEMICAL-VAPOR-DEPOSITION
    COMPLEXES
    OXIDATION
    AMINES
    CU(I)
    FILMS
    Abstract: High purity copper metal is deposited from highly volatile copper complexes at temperatures near 250 degreesC. SEM shows a dense microstructure and relatively small grain size (see Figure), with one of the complexes producing copper with a measured electrical resistivity of 3.4 mu Omega cm, very close to the physical resistivity value of bulk copper and copper with a purity of over 99 %.
    Relation Link: http://www.wiley-vch.de/publish/en/
    URI: http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/81111
    Appears in Collections:[劉兆玄 (1987-1993)] 期刊論文
    [化學系] 期刊論文

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