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    National Tsing Hua University Institutional Repository > 歷任校長 > 劉兆玄 (1987-1993) > 期刊論文 >  New CVD Source Reagents for Osmium Thin Films Deposition


    Please use this identifier to cite or link to this item: http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/81116


    Title: New CVD Source Reagents for Osmium Thin Films Deposition
    Authors: Yu, H.-L.;Chi, Y.;Liu, C.-S.;Peng, S.-M.;Lee, G.-H.
    教師: 劉兆玄
    Date: 2001
    Publisher: Wiley-VCH Verlag Berlin
    Relation: CHEMICAL VAPOR DEPOSITION, Wiley-VCH Verlag Berlin, Volume 7, Issue 6, NOV 2001, Pages 245-248
    Keywords: CHEMICAL-VAPOR-DEPOSITION
    DC-GLOW-DISCHARGE
    METAL-CARBONYLS
    COMPLEXES
    PRECURSORS
    RUTHENIUM
    LIGAND
    RU
    Abstract: High-purity osmium film deposition is reported from two volatile osmuim complexes cis-OS(CO)(4)I-2 and fac-OS(CO)(3)(hfac)(trifluoroacetate). SEM analysis of films grown from CiS-OS(CO)4I2 at 450 degreesC shows snowflake type microcrystalline grains, which change at a higher deposition temperature of 550 degreesC to a closely packed micro crystalline grain structure (see Figure), with a preferred orientation along the (100) planes.
    Relation Link: http://www.wiley-vch.de/publish/en/
    URI: http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/81116
    Appears in Collections:[劉兆玄 (1987-1993)] 期刊論文
    [化學系] 期刊論文

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