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    National Tsing Hua University Institutional Repository > 歷任校長 > 劉兆玄 (1987-1993) > 期刊論文 >  Deposition of Iridium Thin Films Using New Ir(I) CVD Precursors


    Please use this identifier to cite or link to this item: http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/81117


    Title: Deposition of Iridium Thin Films Using New Ir(I) CVD Precursors
    Authors: Chen, Y.-L;Liu, C.-S.;Chi, Y.;Carty, A. J.;Peng, S.-M.;Lee, G.-H.
    教師: 劉兆玄
    Date: 2002
    Publisher: Wiley-VCH Verlag Berlin
    Relation: CHEMICAL VAPOR DEPOSITION, Wiley-VCH Verlag Berlin, Volume 8, Issue 1, JAN 2002, Pages 17-20
    Keywords: CHEMICAL-VAPOR-DEPOSITION
    MO CVD
    COMPLEXES
    GROWTH
    TEMPERATURE
    SODIUM
    Abstract: The syntheses of three volatile Ir-1 cyclooctadiene precursors is described. The anionic ligand was carefully selected to produce a structure (see Figure) with physical properties suitable for CVD requirements. Films grown using oxygen as carrier gas produced iridium thin films with a purity higher than 98 % and a measured resistivity in the range of 8.4 to 10.2 muOmega cm.
    Relation Link: http://www.wiley-vch.de/publish/en/
    URI: http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/81117
    Appears in Collections:[劉兆玄 (1987-1993)] 期刊論文
    [化學系] 期刊論文

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