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    National Tsing Hua University Institutional Repository > 歷任校長 > 劉兆玄 (1987-1993) > 期刊論文 >  Growth of IrO2 Films and Nanorods by Means of Chemical Vapor Deposition: An Example of Compositional and Morphological Control of Nanostructures


    Please use this identifier to cite or link to this item: http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/81124


    Title: Growth of IrO2 Films and Nanorods by Means of Chemical Vapor Deposition: An Example of Compositional and Morphological Control of Nanostructures
    Authors: Chen, R.-S.;Chen, Y.-S.;Huang, Y.-S.;Chen, Y.-L.;Chi, Y.;Liu, C.-S.;Tiong, K.-K.;Carty, A. J.
    教師: 劉兆玄
    Date: 2003
    Publisher: Wiley-VCH Verlag Berlin
    Relation: CHEMICAL VAPOR DEPOSITION, Wiley-VCH Verlag Berlin, Volume 9, Issue 6, DEC 2003, Pages 301-305
    Keywords: CHEMICAL-VAPOR-DEPOSITION
    OXIDE THIN-FILMS
    PULSED-LASER DEPOSITION
    IRIDIUM COATINGS
    SPUTTERED IRO2
    PRECURSOR
    ELECTRODES
    RUO2
    MICROSTRUCTURE
    TEMPERATURE
    Abstract: Conductive iridium oxide films or one-dimensional nanorods are deposited using (MeCp)Ir(COD). A systematic investigation is carried out, showing a close correlation of morphology with deposition pressure and oxygen partial pressure. Of particular interest, are the vertically aligned IrO2 nanorods (see Figure) deposited at 350 °C in 30 torr of oxygen. The surface morphology and structural composition of the materials are confirmed.
    Relation Link: http://www.wiley-vch.de/publish/en/
    URI: http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/81124
    Appears in Collections:[劉兆玄 (1987-1993)] 期刊論文
    [化學系] 期刊論文

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